![一名員工在蔡司半導體的無塵室內看著光罩]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.100.100.219,0,1475,1256.file/wallpaperlonger.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.360.360.219,0,1475,1256.file/wallpaperlonger.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.768.768.219,0,1475,1256.file/wallpaperlonger.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1024.1024.219,0,1475,1256.file/wallpaperlonger.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg"} "蔡司ForTune系統")
光罩校正解決方案
蔡司 ForTune 系統 超越微影技術的極限
晶圓廠高度依賴可預測性和可信度，而高良率為晶圓廠取信客戶的基礎。任何導致良率大幅下降的製程偏差，都會嚴重削弱客戶對晶圓廠製程能力與可靠性的信任。蔡司提供創新解決方案，透過提升曝光區域間關鍵尺寸均勻度（CDU）與優化晶圓的疊對精度（OPO）來防止偏差。
![Tuning Process of a Photomask under a microscope]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.100.100.0,4,1600,1604.file/appbildneu1.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.360.360.0,4,1600,1604.file/appbildneu1.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.768.768.0,4,1600,1604.file/appbildneu1.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1024.1024.0,4,1600,1604.file/appbildneu1.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1280.1280.0,4,1600,1604.file/appbildneu1.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1440.1440.0,4,1600,1604.file/appbildneu1.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1600.1600.0,4,1600,1604.file/appbildneu1.jpg"} "ZEISS Mask Tuning")
![Tuning Process of a Photomask under a microscope]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.100.100.file/appbildneu2.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.360.360.file/appbildneu2.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.768.768.file/appbildneu2.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1024.1024.file/appbildneu2.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1280.1280.file/appbildneu2.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1440.1440.file/appbildneu2.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original./appbildneu2.jpg"} "ZEISS Mask Tuning")
![用於光罩的蔡司ForTune系統]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.100.75.107,0,1814,1280.file/fortune.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.360.270.107,0,1814,1280.file/fortune.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.768.576.107,0,1814,1280.file/fortune.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1024.768.107,0,1814,1280.file/fortune.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1280.960.107,0,1814,1280.file/fortune.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1440.1080.107,0,1814,1280.file/fortune.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1707.1280.107,0,1814,1280.file/fortune.jpg"} "蔡司ForTune")
![用於EUV技術的蔡司ForTune EUV系統]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.100.75.67,0,1134,800.file/fortune-euv.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.360.270.67,0,1134,800.file/fortune-euv.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.768.576.67,0,1134,800.file/fortune-euv.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1024.768.67,0,1134,800.file/fortune-euv.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg"} "蔡司ForTune EUV")
![適用於ForTune和ForTune EUV的蔡司校正應用程式]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.100.75.file/stagecontainer.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.360.270.file/stagecontainer.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.768.576.file/stagecontainer.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1024.768.file/stagecontainer.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1280.960.file/stagecontainer.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1440.1080.file/stagecontainer.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original./stagecontainer.jpg"} "蔡司校正應用程式")
![半導體產業的許多晶片]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.100.100.129,0,850,721.file/wafer-image.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.360.360.129,0,850,721.file/wafer-image.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg"} "蔡司半導體晶片")
減少製程缺陷
藉由使用 ForTune 來預防偏移圖案偏移指的是（多個）參數偏離正常值，導致製程超出允許的誤差範圍。 圖案偏移可能由製程參數及微影參數（如焦點、光罩 CDU 與劑量）共同引發， 即使個別參數符合規格，多種微影參數的交互作用仍可能導致圖案缺陷。
為降低晶圓曝光區域間製程缺陷，採用蔡司 ForTune 系統的偏移預防策略已獲實證成效，此目標可透過 ForTune 的 CDC 應用程式實現：該技術能在晶圓廠以低成本、低投入實現偏移預防，從而大幅降低不良率。
![使用雷射光束處理光罩]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.100.100.0,1,500,501.file/fortune_opo_edited.png","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.360.360.0,1,500,501.file/fortune_opo_edited.png","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png"} "蔡司半導體光罩")
優化晶圓疊對精度
對位控制功能有助提升 DUV 與 EUV 製程的晶圓對位精度晶圓的疊對精度（OPO）是影響晶片效能的另一關鍵限制參數，需嚴格管控。主要影響參數可分為曝光區域間參數與曝光區域內參數兩類，兩者皆可透過掃描式曝光機進行控制。然而，掃描式曝光機在曝光區域內疊對解析度上存在限制，對圖案的控制最高只能達到三次多項式。掃描式曝光機的這項限制會導致高階的不可修正錯誤（NCE），進而造成 OPO 不符規格。ForTune 可將 NCE 轉換為 CE（可修正錯誤），因此可優化曝光區域內貢獻，有助於降低 DUV 與 EUV 光罩之晶圓疊對誤差。
![半導體晶片上的最小結構]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.100.100.129,0,850,721.file/maskstructure1heller.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.360.360.129,0,850,721.file/maskstructure1heller.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg"} "半導體晶片")
優化混合疊對
ForTune EUV 可降低 DUV 和 EUV 光罩層之間以及 EUV 與 EUV 層的疊對誤差高階光罩組是由數個 DUV 光罩和一些 EUV 光罩組成。每一層必須精準地轉印在疊加層上，才能生產具功能性和高效能的晶片。
得益於 RegC® 功能，ForTune EUV 可降低曝光區域內誤差影響，從而優化晶圓混合疊對（MMO）精準度。
![數種蔡司半導體產品型錄]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.100.56.0,0,1919,1080.file/productrange.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.360.203.0,0,1919,1080.file/productrange.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.768.432.0,0,1919,1080.file/productrange.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1024.576.0,0,1919,1080.file/productrange.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1280.720.0,0,1919,1080.file/productrange.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1440.810.0,0,1919,1080.file/productrange.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1919.1079.0,0,1919,1080.file/productrange.jpg"} "蔡司光罩解決方案產品型錄")
![數種蔡司半導體產品型錄]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.100.56.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.360.203.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.768.432.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1024.576.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1280.720.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1440.810.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1911.1075.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg"} "蔡司ForTune解決方案型錄")