![一名員工在蔡司半導體的無塵室內看著光罩]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.100.100.219,0,1475,1256.file/wallpaperlonger.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.360.360.219,0,1475,1256.file/wallpaperlonger.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.768.768.219,0,1475,1256.file/wallpaperlonger.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1024.1024.219,0,1475,1256.file/wallpaperlonger.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wallpaperlonger.jpg/_jcr_content/renditions/original.image_file.1256.1256.219,0,1475,1256.file/wallpaperlonger.jpg"} "蔡司ForTune系統")
光罩校正解決方案
蔡司ForTune系統 超越微影技術的極限
晶圓廠高度依賴可預測性和可信度。達到高良率很重要，才能讓客戶相信晶圓廠的產能。任何降低良率的製程偏差都會大幅降低客戶對晶圓廠能力和可靠性的信任。蔡司提供創新的解決方案，藉由改善曝光區域間的關鍵尺寸均勻性（CDU）和改善晶圓的疊對精度（OPO）來防止偏差。
![Tuning Process of a Photomask under a microscope]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.100.100.0,4,1600,1604.file/appbildneu1.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.360.360.0,4,1600,1604.file/appbildneu1.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.768.768.0,4,1600,1604.file/appbildneu1.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1024.1024.0,4,1600,1604.file/appbildneu1.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1280.1280.0,4,1600,1604.file/appbildneu1.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1440.1440.0,4,1600,1604.file/appbildneu1.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu1.jpg/_jcr_content/renditions/original.image_file.1600.1600.0,4,1600,1604.file/appbildneu1.jpg"} "ZEISS Mask Tuning")
![Tuning Process of a Photomask under a microscope]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.100.100.file/appbildneu2.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.360.360.file/appbildneu2.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.768.768.file/appbildneu2.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1024.1024.file/appbildneu2.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1280.1280.file/appbildneu2.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original.image_file.1440.1440.file/appbildneu2.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/appbildneu2.jpg/_jcr_content/renditions/original./appbildneu2.jpg"} "ZEISS Mask Tuning")
![用於光罩的蔡司ForTune系統]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.100.75.107,0,1814,1280.file/fortune.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.360.270.107,0,1814,1280.file/fortune.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.768.576.107,0,1814,1280.file/fortune.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1024.768.107,0,1814,1280.file/fortune.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1280.960.107,0,1814,1280.file/fortune.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1440.1080.107,0,1814,1280.file/fortune.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune.jpg/_jcr_content/renditions/original.image_file.1707.1280.107,0,1814,1280.file/fortune.jpg"} "蔡司ForTune")
![用於EUV技術的蔡司ForTune EUV系統]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.100.75.67,0,1134,800.file/fortune-euv.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.360.270.67,0,1134,800.file/fortune-euv.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.768.576.67,0,1134,800.file/fortune-euv.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1024.768.67,0,1134,800.file/fortune-euv.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune-euv.jpg/_jcr_content/renditions/original.image_file.1067.800.67,0,1134,800.file/fortune-euv.jpg"} "蔡司ForTune EUV")
![適用於ForTune和ForTune EUV的蔡司校正應用程式]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.100.75.file/stagecontainer.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.360.270.file/stagecontainer.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.768.576.file/stagecontainer.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1024.768.file/stagecontainer.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1280.960.file/stagecontainer.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original.image_file.1440.1080.file/stagecontainer.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/stagecontainer.jpg/_jcr_content/renditions/original./stagecontainer.jpg"} "蔡司校正應用程式")
![半導體產業的許多晶片]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.100.100.129,0,850,721.file/wafer-image.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.360.360.129,0,850,721.file/wafer-image.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/wafer-image.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/wafer-image.jpg"} "蔡司半導體晶片")
減少製程瑕疵
藉由使用ForTune來預防偏差圖案偏差是指（數個）參數偏離正常值，因此導致製程超出允許的誤差範圍。 圖案偏差可能是製程參數和微影參數所致，例如：對焦、光罩CDU和劑量。 即便個別參數符合規格，但多種微影參數的相互關係也可能導致圖案瑕疵。
為減少晶圓曝光區域間的製程瑕疵，蔡司ForTune系統的預防偏差是有效的策略。可透過使用ForTune的CDC應用程式來達成此目的：該應用程式可使晶圓廠輕鬆預防偏差，且成本低。因此，可大幅降低不良率。
![使用雷射光束處理光罩]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.100.100.0,1,500,501.file/fortune_opo_edited.png","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.360.360.0,1,500,501.file/fortune_opo_edited.png","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/fortune_opo_edited.png/_jcr_content/renditions/original.image_file.500.500.0,1,500,501.file/fortune_opo_edited.png"} "蔡司半導體光罩")
改善晶圓在OPO的疊對精度
對位控制功能有助於提升DUV和EUV的OPO精準度晶圓在產品上的疊對精度（OPO）是另一個限制晶片效能的關鍵參數，必須加以妥善控制。主要的相關參數可分為曝光區域內和曝光區域間的誤差。兩者皆可透過曝光機控制。 然而，曝光機對曝光區域間的疊對解析度有限，僅能在掃描狹縫範圍內控制到三階多項式的校正能力。 曝光機的這項限制會導致高階的不可修正錯誤（NCE），進而造成OPO不符合規格。 ForTune可將NCE轉換為CE（可修正錯誤） ，因此可改善曝光區域間的相關參數。這有助於降低晶圓上DUV及EUV光罩疊對誤差。
![半導體晶片上的最小結構]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.100.100.129,0,850,721.file/maskstructure1heller.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.360.360.129,0,850,721.file/maskstructure1heller.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/maskstructure1heller.jpg/_jcr_content/renditions/original.image_file.721.721.129,0,850,721.file/maskstructure1heller.jpg"} "半導體晶片")
已改善的混搭疊對
ForTune EUV可降低DUV和EUV光罩層之間以及EUV與EUV層的疊對誤差高階光罩組是由數個DUV光罩和一些EUV光罩組成。每一層必須精準地轉印在疊加層上，才能生產具功能性和高效能的晶片。
ForTune EUV提供的RegC®功能，可減少曝光區域間的誤差，進而優化晶圓混搭疊對（Mix & Match Overlay，MMO）精準度。
![數種蔡司半導體產品型錄]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.100.56.0,0,1919,1080.file/productrange.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.360.203.0,0,1919,1080.file/productrange.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.768.432.0,0,1919,1080.file/productrange.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1024.576.0,0,1919,1080.file/productrange.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1280.720.0,0,1919,1080.file/productrange.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1440.810.0,0,1919,1080.file/productrange.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/productrange.jpg/_jcr_content/renditions/original.image_file.1919.1079.0,0,1919,1080.file/productrange.jpg"} "蔡司光罩解決方案產品型錄")
![數種蔡司半導體產品型錄]({"xsmall":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.100.56.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","small":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.360.203.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","medium":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.768.432.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","large":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1024.576.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","xlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1280.720.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","xxlarge":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1440.810.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg","max":"https://www.zeiss.com.tw/content/dam/smt/products/sms/imag/zeiss-fortune-brochure-cover.jpg/_jcr_content/renditions/original.image_file.1911.1075.3,0,1914,1076.file/zeiss-fortune-brochure-cover.jpg"} "蔡司ForTune解決方案型錄")